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Table 2 Iodide-oxidation at different wavelength of illumination and in tubular and immersion reactors*

From: Photoproduction of iodine with nanoparticulate semiconductors and insulators

Oxide Iodine-formation (nM s-1) Iodine-formed (μM)
  254 nm-illuminationa 365 nm- illuminationb Tubular reactorc Immersion reactord
TiO2 (anatase) 298 170 9.7 58
TiO2 P25 46 45 1.8 20
TiO2 Hombikat 56 49 2.8 5.4
TiO2 (rutile) 22 2.2 0.11 0.55
BaTiO3 38 2.8 0.24 0.03
ZnO 25 6.3 0.31 0.90
SnO2 21 1.8 0.11 0.28
WO3 30 0.9 0.07 0.17
CuO 24 0.3 0.02 0.01
Fe2O3 27 1.3 0.08 0.30
Fe3O4 25 0.5 0.04 0.01
ZrO2 21 0.6 0.05 0.02
Al2O3 34 6.8 0.40 1.1
SiO2 43 6.8 0.55 1.8
SiO2 (porous) 27 5.9 0.29 0.18
  1. *0.020 g oxide loading, 0.050 M iodide, 7.8 mL s-1 airflow, 22.4 mg L-1 dissolved O2, 30 min illumination.
  2. a6.2 μEinstein L-1 s-1, 10 mL iodide solution.
  3. b18.4 μEinstein L-1 s-1, 10 mL iodide solution.
  4. c365 nm, 25.2 μEinstein L-1 s-1, 25 mL iodide solution.
  5. d365 nm, 33.9 μEinstein L-1 s-1, 250 mL iodide solution