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Table 2 Iodide-oxidation at different wavelength of illumination and in tubular and immersion reactors*

From: Photoproduction of iodine with nanoparticulate semiconductors and insulators

Oxide

Iodine-formation (nM s-1)

Iodine-formed (μM)

 

254 nm-illuminationa

365 nm- illuminationb

Tubular reactorc

Immersion reactord

TiO2 (anatase)

298

170

9.7

58

TiO2 P25

46

45

1.8

20

TiO2 Hombikat

56

49

2.8

5.4

TiO2 (rutile)

22

2.2

0.11

0.55

BaTiO3

38

2.8

0.24

0.03

ZnO

25

6.3

0.31

0.90

SnO2

21

1.8

0.11

0.28

WO3

30

0.9

0.07

0.17

CuO

24

0.3

0.02

0.01

Fe2O3

27

1.3

0.08

0.30

Fe3O4

25

0.5

0.04

0.01

ZrO2

21

0.6

0.05

0.02

Al2O3

34

6.8

0.40

1.1

SiO2

43

6.8

0.55

1.8

SiO2 (porous)

27

5.9

0.29

0.18

  1. *0.020 g oxide loading, 0.050 M iodide, 7.8 mL s-1 airflow, 22.4 mg L-1 dissolved O2, 30 min illumination.
  2. a6.2 μEinstein L-1 s-1, 10 mL iodide solution.
  3. b18.4 μEinstein L-1 s-1, 10 mL iodide solution.
  4. c365 nm, 25.2 μEinstein L-1 s-1, 25 mL iodide solution.
  5. d365 nm, 33.9 μEinstein L-1 s-1, 250 mL iodide solution