Table 2 Specifications of the devices and the methods used for characterization of powders and consolidated samples
Method | Device | Specification |
|---|---|---|
XRD | X’ Pert Pro, Panalytical Co | Cu Kα radiation (λ = 1.5406 Å, 40 kV, 40 mA) |
Raman spectroscopy | Renishaw inVia spectrometer | Wavelength of 532 nm, green laser (recording 5 times for 10 s of each accumulation) |
FTIR | VERTEX 70, Bruker Corp | Applying 200 MPa pressures (1 mm thickness) |
FESEM | Hitachi S4700 equipped with energy dispersive X-ray spectroscopy | Au coated by sputtering |
TEM | CM120, Philips | – |
HAADF, EDS | TALOS F200A with a twin lens system | using TALOS microscope in STEM mode, exposure times of 5 min were used to create elemental distribution maps |
ICP | DV7300, Optima Co | – |